A Radiation Model of a Rapid Thermal Processing System

Abigail Wacher, Brian Seymour


A model of the radiative heat transfer that takes place in an
axially symmetric rapid thermal processing chamber is presented. The model
is derived using the theory of shape factors, and is used to predict how
chamber geometry and materials affect temperature uniformity on the
processed silicon wafer. Using a series of numerical experiments we predict
the effects on the temperature uniformity of the size and reflectivity of
the showerhead, the guard ring, and the chamber height.

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